Memory device and manufacturing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7554144
APP PUB NO 20070241371A1
SERIAL NO

11279945

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Abstract

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A memory device includes first and second electrodes separated by an insulating member comprising upwardly and inwardly tapering surfaces connected by a surface segment. A bridge, comprising memory material, such as a phase change material, switchable between electrical property states by the application of energy, is positioned across the surface segment and in contact with the electrodes to define an inter-electrode path defined at least in part by the length of the surface segment. According to a method for making a memory cell device, the tapering surfaces may be created by depositing a dielectric material cap using a high density plasma (HDP) deposition procedure. The electrodes and the dielectric material cap may he planarized to create the surface segment on the dielectric material. At least one of the dielectric material depositing step and the planarizing step may be controlled so that the length of the surface and segment is within a chosen dimensional range, such as between 10 nm and 100 nm.

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Patent Owner(s)

  • MACRONIX INTERNATIONAL CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ho, Chiahua Kaoshing, TW 74 3831
Hsieh, Kuang Yeu Hsinchu County, TW 65 3129
Lai, Erh-Kun Longjing Shiang, TW 253 5910

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