Partially modified photosensitive monolithic glass apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
N/A
app pub date -
Oct 30, 2002
filing date -
Jul 29, 1997
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A partially modified photosensitive monolithic oxide glass apparatus formed through photolithographic imaging. The apparatus may be either a volume apparatus or a layer apparatus. Both types of apparatus may be used to diffuse light in predetermined directions or shapes. The monolithic oxide glass apparatus is capable of withstanding temperatures well beyond glass transition temperatures of plastic light shaping devices and can be formed in convex or concave surfaces through conventionally molding grinding or polishing techniques and can be coated by hot-coating techniques.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully