Lithographic apparatus and device manufacturing method using interferometric and other exposure

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United States of America Patent

PATENT NO 8264667
APP PUB NO 20070258078A1
SERIAL NO

11417210

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Abstract

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A lithographic apparatus including an exposure unit that exposes parallel lines on a target area of a substrate by projecting two beams of radiation onto the substrate. The two beams of radiation are projected such that they interfere with each other to form the parallel lines. An actuator continuously moves the substrate relative to the exposure unit, while the exposure unit exposes the parallel lines on the target areas on the substrate.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baselmans, Johannes Jacobus Matheus Oirschot, NL 160 4011
Greeneich, James Sherwood Prescott, US 4 99
Troost, Kars Zeger Waalre, NL 33 477

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