Illumination system and a photolithography apparatus employing the system
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United States of America Patent
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N/A
Issued Date -
Nov 15, 2007
app pub date -
May 14, 2007
filing date -
May 15, 2006
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An illumination system includes a device for generating an illumination distribution, the illumination distribution having a center point and an outer edge. The illumination distribution includes a first opaque portion defined about the center point, a second opaque portion defined adjacent to the outer edge, and a radiation transmittant portion disposed between the first and the second opaque portions. The illumination system further includes a polarization device that generates a linearly polarized electromagnetic radiation having a locally varying polarization direction so that at least first and second polarization directions are generated. The first polarization direction is different from the second polarization direction and the polarization direction at at least two different points of the radiation transmittant portion of the illumination distribution is parallel to a line connecting that point and the center point of the illumination distribution. A photolithography apparatus employing the illumination system is also provided.
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