Method for forming poly-silicon film
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United States of America Patent
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Aug 10, 2010
Grant Date -
Nov 22, 2007
app pub date -
Nov 20, 2006
filing date -
May 16, 2006
priority date (Note) -
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Abstract
A method for forming a poly-silicon film, using sequential lateral solidification (SLS) by laser irradiation through an optical device to pattern the laser beam and provide a periodic energy profile on the edges of transparent regions so as to widen the poly-silicon grains and achieve grain size uniformity. The optical device comprises a plurality of first transparent regions with a length of L, wherein at least one side of the edge of each of the first transparent regions has a first periodic shape.
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