Ring assembly for substrate processing chamber
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United States of America Patent
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Issued Date -
Dec 13, 2007
app pub date -
May 30, 2006
filing date -
May 30, 2006
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A ring assembly is provided for a substrate support used in a substrate processing chamber, the substrate support comprising an annular ledge and an inner perimeter sidewall. In one version, the ring assembly comprises (i) an L-shaped isolator ring comprising a horizontal leg resting on the annular ledge of the support, and a vertical leg abutting the inner perimeter sidewall of the support, and (ii) a deposition ring comprising an annular band having an overlap ledge that overlaps the horizontal leg of the isolator ring. In another version, the deposition ring comprises a dielectric annular band that surrounds and overlaps the annular ledge of the support, and a bracket and fastener.
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