Lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 8115899
SERIAL NO

11656560

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. A cleaning device may be provided in the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VVELDHOVEN

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baselmans, Johannes Jacobus Matheus Oirschot, NL 163 4062
Donders, Sjoerd Nicolaas Lambertus ′s-Hertogenbosch, NL 253 8312
Grouwstra, Cedric Desire Eindhoven, NL 18 695
Hoogendam, Christiaan Alexander Veldhoven, NL 205 9950
Jansen, Hans Eindhoven, NL 138 3423
Mertens, Jeroen Johannes Sophia Maria Duizel, NL 160 6273
Mulkens, Johannes Catharinus Hubertus Waalre, NL 213 10886
Stavenga, Marco Koert Eindhoven, NL 69 1191
Streefkerk, Bob Tilburg, NL 201 10575
Van, Der Hoeven Jan Cornelis Veldhoven, NL 16 179

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