Lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 8115899
SERIAL NO

11656560

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. A cleaning device may be provided in the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baselmans, Johannes Jacobus Matheus Oirschot, NL 160 4010
Donders, Sjoerd Nicolaas Lambertus ′s-Hertogenbosch, NL 248 8208
Grouwstra, Cedric Desire Eindhoven, NL 18 661
Hoogendam, Christiaan Alexander Veldhoven, NL 205 9819
Jansen, Hans Eindhoven, NL 138 3342
Mertens, Jeroen Johannes Sophia Maria Duizel, NL 160 6214
Mulkens, Johannes Catharinus Hubertus Waalre, NL 211 10739
Stavenga, Marco Koert Eindhoven, NL 69 1160
Streefkerk, Bob Tilburg, NL 201 10446
Van, Der Hoeven Jan Cornelis Veldhoven, NL 16 171

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