MEASURING DEVICE OF AN HF PLASMA SYSTEM
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United States of America Patent
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Issued Date -
Jan 17, 2008
app pub date -
Mar 23, 2007
filing date -
Mar 25, 2006
priority date (Note) -
Abandoned
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Abstract
A measuring device of an HF plasma system includes an uncoupling device for uncoupling one or a plurality of signals related to a power and at least one filter arrangement to which such a signal is transmitted. The filter arrangement is designed as a band pass filter arrangement and includes a first and a second filter element between which a decoupling device is arranged.
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