Interspinous process implants and methods of use
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United States of America Patent
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Jan 10, 2012
Grant Date -
Feb 7, 2008
app pub date -
Jun 26, 2007
filing date -
Oct 29, 2002
priority date (Note) -
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Abstract
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
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