Power Delivery Control and Balancing Between Multiple Loads
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United States of America Patent
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app pub date -
May 15, 2007
filing date -
Feb 15, 2003
priority date (Note) -
Abandoned
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Abstract
A plasma process machine includes at least two electrodes disposed in a processing chamber and in contact with targets, an alternating current source connected to supply power to the electrodes, and a power delivery controller adapted to control power delivered by the alternating current source to the electrodes. The power delivery controller is configured to determine a control value from a comparison between actual power delivery as detected by a detector and a desired power delivery, and to adjust power delivery based on the control.
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