Radiation pulse energy control system, lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 7626182
APP PUB NO 20080054190A1
SERIAL NO

11515378

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Abstract

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A system for controlling the energy of radiation pulses. A detector monitors energy of the pulses and an optical shutter trims the radiation pulses after a suitable optical delay line. The accuracy of the control of the energy of the radiation pulses can be improved by matching a rate of response of the radiation detector to a rate of response of the optical shutter.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Noordman, Oscar Franciscus Jozephus Hapert , NL 14 59

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