Photoresist stripping apparatus and internal air circulating system thereof
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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N/A
Issued Date -
Mar 6, 2008
app pub date -
Sep 4, 2007
filing date -
Sep 1, 2006
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An apparatus for stripping photoresists from a substrate includes a reaction chamber, a plurality of air guiding means provided inside the reaction chamber, a pump for extracting air inside the reaction chamber, and a pipe for circulating and feeding the extracted air back into the reaction chamber. The upper and lower surfaces of the substrate are blown with the extracted air from the air guiding means.
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