Methods and systems to compensate for a stitching disturbance of a printed pattern
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United States of America Patent
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Dec 8, 2009
Grant Date -
Apr 24, 2008
app pub date -
Dec 13, 2007
filing date -
Sep 30, 2003
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.
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