Methods and systems to compensate for a stitching disturbance of a printed pattern
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United States of America Patent
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Aug 10, 2010
Grant Date -
Apr 24, 2008
app pub date -
Dec 13, 2007
filing date -
Sep 30, 2003
priority date (Note) -
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Abstract
A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.
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