Planar etching of dissimilar materials
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
May 15, 2008
app pub date -
Jun 28, 2007
filing date -
Nov 11, 2006
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A method of planar etching of dissimilar materials with a Focused Ion Beam (FIB) system such as the OptiFIB manufactured by Credence Systems. The method includes adjusting the selectivity between the two materials, which varies when the ratio of the assisting chemistry pressure to the ion dose rate changes. This method can be used in such applications as FIB circuit edit, failure analysis, and cross sectioning.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully