POLISHING COMPOSITION AND POLISHING METHOD
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United States of America Patent
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app pub date -
Nov 30, 2007
filing date -
Mar 19, 2004
priority date (Note) -
Abandoned
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Abstract
A polishing composition contains alumina, a complexing agent, and an oxidizing agent. It is preferable that the complexing agent is at least one compound selected from an .alpha.-amino acid, ammonia, and an ammonium salt. The polishing composition is preferably used in applications for polishing an object having a resin section with a trench, and a conductor layer provided on the resin section so that at least the trench is filled with the conductor layer.
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