INTEGRATED CIRCUIT SYSTEM WITH IMPLANT OXIDE
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United States of America Patent
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N/A
Issued Date -
Jun 19, 2008
app pub date -
Dec 16, 2006
filing date -
Dec 16, 2006
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method for forming an integrated circuit system is provided including forming a substrate; forming a stack over the substrate, the stack having a sidewall and formed from a charge trap layer and a semi-conducting layer; and slot plane antenna oxidizing the stack for forming a protection enclosure having a protection layer along the sidewall.
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