Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data

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United States of America Patent

PATENT NO 8259285
APP PUB NO 20080143982A1
SERIAL NO

11638675

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Abstract

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An iterative method of producing optimized setpoint data for controlling the actuation of elements of an array of individually controllable elements in a maskless system and systems therefore. The optimization is based on estimation of a device structure that can utilizes one or more of the following factors: the low-pass characteristics of the projection system, the configuration of the illumination system, and the process window properties.

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Patent Owner(s)

  • ASML HOLDING N.V.;ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Albright, Ronald P Norwalk, US 2 9
Cebuhar, Wenceslao A Norwalk, US 21 164
Hintersteiner, Jason Douglas Norwalk, US 7 535
Kastrup, Bernardo Eindhoven, NL 15 110
Tinnemans, Patricius Aloysius Jacobus Hapert, NL 109 1285
Troost, Kars Zeger Waalre, NL 33 477

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