REACTIVE SPUTTER DEPOSITION OF A TRANSPARENT CONDUCTIVE FILM
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United States of America Patent
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Issued Date -
Jun 26, 2008
app pub date -
Dec 21, 2006
filing date -
Dec 21, 2006
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Methods for sputter depositing a transparent conductive oxide (TCO) layer are provided in the present invention. The transparent conductive oxide layer may be utilized as a back reflector in a photovoltaic device. In one embodiment, the method includes providing a substrate in a processing chamber, forming a first portion of a transparent conductive oxide layer on the substrate by a first sputter deposition step, and forming a second portion of the transparent conductive oxide layer by a second sputter deposition step.
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