Focused Ion Beam Apparatus
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United States of America Patent
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Issued Date -
Jul 3, 2008
app pub date -
Dec 20, 2007
filing date -
Dec 28, 2006
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A focused ion beam apparatus including a plasma type gas ion source for generating an ion beam, and an ion optical system for gathering the ion beam generated from the plasma type gas ion source onto a sample. The ion optical system is constructed by a constitution having 2 pieces of basic electrostatic lenses and an ion optical system magnification of the 2 pieces of basic electrostatic lenses is set to be equal to or smaller than 1/300.
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