ENHANCED DIAMOND POLISHING
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United States of America Patent
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Issued Date -
Jul 17, 2008
app pub date -
Jan 17, 2007
filing date -
Jan 17, 2007
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A grown single crystal diamond is polished using a non contact polishing technique, which leaves a residue on the diamond surface. In one embodiment, a wet chemical etch is performed to remove the residue, leaving a highly polished single crystal diamond surface. In a further embodiment, a colloidal silica solution is used in combination with rotating polishing pads to remove the residue. Both residue removing techniques may be used in further embodiments.
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