High strength vacuum deposited nitinol alloy films and method of making same
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United States of America Patent
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Dec 27, 2011
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Oct 19, 2007
filing date -
Nov 19, 1999
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Abstract
A vacuum deposition method for fabricating high-strength nitinol films by sputter depositing nickel and titanium from a heated sputtering target, and controlling the sputter deposition process parameters in order to create high-strength nitinol films that exhibit shape memory and/or superelastic properties without the need for precipitation annealing to attenuate the transition conditions of the deposited material. A vacuum deposited nitinol film having high-strength properties equal to or better than wrought nitinol films and which are characterized by having non-columnar crystal grain structures.
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