Substrate For Thin Film Photoelectric Conversion Device and Thin Film Photoelectric Conversion Device Including the Same
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United States of America Patent
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Issued Date -
Aug 7, 2008
app pub date -
Nov 9, 2005
filing date -
Nov 29, 2004
priority date (Note) -
Abandoned
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Abstract
An object of the present invention is to provide a substrate for a thin film photoelectric conversion device, in which its properties are not deteriorated when its surface unevenness is effectively increased, and then provide the thin film photoelectric conversion device having its performance improved by using the substrate. According to the present invention, by setting the surface area ratio of a transparent electrode layer in the substrate for the thin film photoelectric conversion device to at least 55% and at most 95%, the surface unevenness are effectively increased to increase the optical confinement effect, while deterioration in properties due to sharpening of the surface level variation is suppressed, whereby making it possible to provide a substrate for a thin film photoelectric conversion device, which can enhance output properties of the thin film photoelectric conversion device.
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