SINGLE CHAMBER, MULTIPLE TUBE HIGH EFFICIENCY VERTICAL FURNACE SYSTEM
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United States of America Patent
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Issued Date -
Sep 4, 2008
app pub date -
Jan 17, 2008
filing date -
Jan 18, 2007
priority date (Note) -
Abandoned
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Abstract
A processing system is provided that has a single chamber in communication with multiple vertical processing tubes. The multiple tubes and boats are serviced by a single robotic substrate loading mechanism. A fluid supply feeds a fluid such as a gas or a vapor to at least one selectively isolatable portion of the system of the chamber, the boat loading area or one of the multiple vertical furnace processing tubes. With selective control of the atmosphere in the vertical processing tubes within the processing chamber, the wafers are processed so as to deposit or remove material therefrom. A single control panel and single gas panel servicing the system further adds to overall efficiency.
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