Medium For Etching Oxidic, Transparent, Conductive Layers
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United States of America Patent
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N/A
Issued Date -
Sep 4, 2008
app pub date -
Jun 8, 2006
filing date -
Jul 4, 2005
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The present invention relates to a novel dispensable medium for etching doped tin oxide layers having non-Newtonian flow behaviour for etching surfaces in the production of displays and/or solar cells and to the use thereof. In particular, it relates to corresponding particle-free compositions by means of which fine structures can be etched selectively without damaging or attacking adjacent areas.
First Claim
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International Classification(s)
- C09K:MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED ....
- C03C:CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREO....
- B29D:PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FRO....
- H01B:CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATER....
- C23F:NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM S....
- B44C:PRODUCING DECORATIVE EFFECTS
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