Semiconductor Processing System With Integrated Showerhead Distance Measuring Device
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United States of America Patent
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Issued Date -
Oct 9, 2008
app pub date -
Mar 26, 2008
filing date -
Apr 5, 2007
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A system for determining a distance between a showerhead of a semiconductor processing system and a substrate-supporting pedestal is provided. The system includes a showerhead having a showerhead surface from which reactive gas is expelled and a pedestal having a pedestal surface that faces the showerhead surface. A first capacitive plate is disposed on the pedestal surface. A second capacitive plate is disposed on the showerhead surface. A third capacitive plate disposed on one of the showerhead surface and the pedestal surface, but spaced from the first and second capacitive plates. Capacitance measurement circuitry is operably coupled to the first, second and third capacitive plates.
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