Implant Particularly Stent, and Method For the Production of Such an Implant
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United States of America Patent
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Issued Date -
Oct 23, 2008
app pub date -
Oct 19, 2006
filing date -
Nov 8, 2005
priority date (Note) -
Abandoned
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Abstract
An implant, particularly a stent, and a method for producing such an implant. The implant (10), particularly the stent (11), has a surface (15) that is coated with a thin layer (16) made of titanium (Ti) and titanium dioxide (TiO.sub.2), the thin layer (16) having an outer surface layer (17) made of the TiO.sub.2 mineral anatase. Particularly preferably, the outer surface layer (17) is formed as a photoactive or photoactivatable, especially photocatalytic or photosensitive layer. The inventive method comprises the following vacuum process steps: plasma pretreatment during which the edges of the base material of the implant are rounded; sputtering of an intermediate layer made of titanium (Ti); sputtering of a surface layer made of the titanium dioxide (TiO.sub.2) mineral anatase.
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