APPARATUS FOR OPTICAL INSPECTION OF WAFERS DURING POLISHING
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United States of America Patent
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app pub date -
Aug 8, 2008
filing date -
May 23, 1995
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Abandoned
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Abstract
A measurement system installable within a processing equipment and more specifically within the exit station of a polishing machine. The optical scheme of this system includes a spectrophotometric channel, an imaging channel and also means for holding the wafer under measurement.
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