REACTOR WITH HEATED AND TEXTURED ELECTRODES AND SURFACES
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United States of America Patent
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app pub date -
Sep 2, 2008
filing date -
Dec 2, 1999
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Abstract
A reactor for processing semiconductor wafers with electrodes and other surfaces that can be one of heated, textured and/or pre-coated in order to facilitate adherence of materials deposited thereon, and eliminate the disadvantages resulting from the spaulding, flaking and/or delaminating of such materials which can interfere with semiconductor wafer processing.
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