Ceramic Thin Film On Various Substrates, and Process for Producing Same
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United States of America Patent
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app pub date -
Jul 7, 2008
filing date -
May 23, 2002
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Abandoned
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Abstract
. Many devices can be fabricated by the PA-CVD method of the invention such as; solar cells; light-emitting diodes; transistors; photothyristors, as well as integrated monolithic devices on a single chip. Using this novel technique, high deposition rates can be obtained from chemically synchronized Si—C bonds redistribution in organo-polysilanes in the temperature range of about 200-450° C.
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