MEMS devices having improved uniformity and methods for making them
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United States of America Patent
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Nov 29, 2011
Grant Date -
Jan 8, 2009
app pub date -
Jul 3, 2007
filing date -
Jul 3, 2007
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Disclosed is a microelectromechanical system (MEMS) device and method of manufacturing the same. In one aspect, MEMS such as an interferometric modulator include one or more elongated interior posts and support rails supporting a deformable reflective layer, where the elongated interior posts are entirely within an interferometric cavity and aligned parallel with the support rails. In another aspect, the interferometric modulator includes one or more elongated etch release holes formed in the deformable reflective layer and aligned parallel with channels formed in the deformable reflective layer defining parallel strips of the deformable reflective layer.
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