IN-SITU ION SOURCE CLEANING FOR PARTIAL PRESSURE ANALYZERS USED IN PROCESS MONITORING
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United States of America Patent
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Issued Date -
Jan 15, 2009
app pub date -
Jul 10, 2008
filing date -
Jul 13, 2007
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An ion source apparatus for partial pressure analyzers and in-situ cleaning method thereof based on inducing a hollow cathode discharge (HCD) inside the ion source. The HCD is formed by applying a high negative voltage to one or more parts of the ion source, including the anode electrode, the lens focus plate and at least one other lens or other form of plate, such as a total pressure collector plate.
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