Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer
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United States of America Patent
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Jun 14, 2011
Grant Date -
Jan 22, 2009
app pub date -
May 6, 2008
filing date -
May 7, 2007
priority date (Note) -
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Abstract
Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer are provided. One method includes generating simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions. The method also includes determining one or more characteristics of the reticle features of the simulated images. In addition, the method includes comparing the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process. The method further includes selecting one of the different generated models as the model to be used for predicting the printability of the reticle features based on results of the comparing step.
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