US Patent Application No: 2009/0053,863

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Mask and Manufacturing Method of a Semiconductor Device and a Thin Film Transistor Array Panel Using the Mask

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ALSO PUBLISHED AS: 7767506
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Abstract

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An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about −70° to about +70°.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
SAMSUNG DISPLAY CO., LTD.SUWON-SI GYEONGGI-DO7698

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Han, Ji-Haeng Gunpo-si, KR 5 0
Jung, Bae-Hyoun Seongnam-si, KR 12 9
Jung, Young-Bae Gyeonggi-do, KR 64 121
Kim, Jong-An Suwon-si, KR 23 22

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