US Patent Application No: 2009/0053,863

Mask and Manufacturing Method of a Semiconductor Device and a Thin Film Transistor Array Panel Using the Mask

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Feb 26, 2009
Publication date
Oct 24, 2008
filing date
12/258,228
serial no
Granted
status

ALSO PUBLISHED AS: 7767506

Importance

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Abstract

An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about −70° to about +70°.

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First Claim

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Patent Owner(s)

Patent Owner	Address	Total Patents
SAMSUNG DISPLAY CO., LTD.	SUWON-SI GYEONGGI-DO	6461

International Classification(s)

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Han, Ji-Haeng	Gunpo-si, KR	5	0
Jung, Bae-Hyoun	Seongnam-si, KR	12	8
Jung, Young-Bae	Gyeonggi-do, KR	61	96
Kim, Jong-An	Suwon-si, KR	22	18

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