ATOMIC LAYER DEPOSITION CHAMBER AND COMPONENTS
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United States of America Patent
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Issued Date -
Apr 2, 2009
app pub date -
Sep 28, 2007
filing date -
Sep 28, 2007
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An atomic layer deposition chamber comprises a gas distributor comprising a central cap having a conical passageway between a gas inlet and gas outlet. The gas distributor also has a ceiling plate comprising first and second conical apertures that are connected. The first conical aperture receives a process gas from the gas outlet of the central cap. The second conical aperture extends radially outwardly from the first conical aperture. The gas distributor also has a peripheral ledge that rests on a sidewall of the chamber.
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