METHODS AND APPARATUS FOR COST-EFFECTIVELY INCREASING FEATURE DENSITY USING A MASK SHRINKING PROCESS WITH DOUBLE PATTERNING
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United States of America Patent
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Issued Date -
Apr 2, 2009
app pub date -
Sep 28, 2007
filing date -
Sep 28, 2007
priority date (Note) -
Abandoned
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Abstract
Methods and apparatus are provided for forming an array of devices. The invention includes forming a stack of material layers, forming a first hardmask over the plurality of material layers, exposing the first hardmask to ozone mixed with a halogenated additive, forming a protective layer over the first hardmask, forming a second mask on the protective layer shifted relative to the first mask, exposing the second hardmask to ozone mixed with the halogenated additive, and etching the plurality of material layers to remove material not covered by the hardmasks. Numerous other aspects are disclosed.
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