Composition for Removing Photresist Layer and Method for Using it
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United States of America Patent
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Issued Date -
Apr 16, 2009
app pub date -
May 12, 2006
filing date -
May 13, 2005
priority date (Note) -
Abandoned
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Abstract
A new composition for removing a photoresist layer and a method for using the same are disclosed. The composition comprises a polar solvent and an oxidant. The composition according to the present invention comprises chemical substances with less toxicity and flammability at lower contents, which makes it more friendly to environment and decreases the expense for disposing the chemical waste. The method for using the composition shortens the time for cleaning and removes the residue more completely, thereby enhancing the electrical conductivity.
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