Etching processes used in MEMS production
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United States of America Patent
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-
Dec 4, 2012
Grant Date -
Apr 23, 2009
app pub date -
Sep 12, 2008
filing date -
Sep 14, 2007
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The efficiency of an etching process may be increased in various ways, and the cost of an etching process may be decreased. Unused etchant may be isolated and recirculated during the etching process. Etching byproducts may be collected and removed from the etching system during the etching process. Components of the etchant may be isolated and used to general additional etchant. Either or both of the etchant or the layers being etched may also be optimized for a particular etching process.
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