REACTOR WITH SMALL LINEAR LAMPS FOR LOCALIZED HEAT CONTROL AND IMPROVED TEMPERATURE UNIFORMITY
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United States of America Patent
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N/A
Issued Date -
Apr 23, 2009
app pub date -
Oct 19, 2007
filing date -
Oct 19, 2007
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An arrangement of short linear heat lamps is provided which allows for localized control of temperature nonuniformities in a substrate during semiconductor processing. A reactor includes a substrate holder positioned between a top bank and a bottom bank of linear heat lamps. Alternatively, only one such bank may be provided. At least one of the banks includes lamps of a plurality of different lengths, at least some of the lengths being shorter than a diameter of the substrate holder. In some configurations, the lamps in a bank are disposed substantially parallel to each other in a repeating pattern. In some other configurations, the lamps in a bank are disposed in a radial direction with respect to a vertical axis of the substrate holder. Power output of the short lamps can be adjusted individually or in groups to provide localized control of temperature of the substrate.
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