Defect recognizing method, defect observing method, and charged particle beam apparatus
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United States of America Patent
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Issued Date -
May 28, 2009
app pub date -
Oct 31, 2008
filing date -
Nov 1, 2007
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
There are provided a detecting step of detecting secondary charged particles generated from an observation area of a sample when an electron beam or a focused ion beam is emitted onto the observation area under a certain irradiation condition; an image forming step of forming a plurality of observation images acquired by dividing the observation area and having an equal periodic pattern, from the secondary charged particles detected in the detecting step; and a defect recognizing step of recognizing a defect in the observation area from information on a difference acquired by comparing the plurality of observation images formed in the image forming step. Additionally, the detecting step, the image forming step, and the defect recognizing step are performed even when the electron beam or the focused ion beam is emitted onto the observation area under an irradiation condition different from the certain irradiation condition.
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