PLASMA PROCESSING APPARATUS
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United States of America Patent
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app pub date -
Jun 6, 2007
filing date -
Jul 9, 1997
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Abandoned
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Abstract
A slotted conducting cylinder (11) surrounds a reactor chamber body (10) and is in turn surrounded by an antenna (12). The cylinder (11) can be grounded during normal operation of plasma processing apparatus, but when RF driven it serves to enhance capacitive coupling with the plasma causing the inner surface (16) of the body (10) to become charged and hence the plasma will sputter clean the inner surface (16).
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