MULTI-LINE SUBSTRATE TREATING APPARATUS

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United States of America Patent

APP PUB NO 20090139833A1
SERIAL NO

12324788

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Abstract

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A substrate treating apparatus includes substrate treatment lines arranged one over another, each for treating substrates while transporting the substrates substantially horizontally. The apparatus further includes an interface section for transporting the substrates between the substrate treatment lines and an exposing machine having a plurality of exposing stages, the exposing machine being provided separately from the apparatus, and a controller for controlling transport of the substrates in the interface section to cause all the substrates similarly treated in each of the substrate treatment lines to be exposed on one of the exposing stages. This apparatus can uniform the quality of treatment among a plurality of substrates receiving the same type of treatment in the same substrate treating line.

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Patent Owner(s)

Patent OwnerAddress
SCREEN SEMICONDUCTOR SOLUTIONS CO LTD(FORMERLY OF 88 KANKOBOKO-CHO SHIJODORI-MUROMACHI-HIGASHIIRU SHIMOGYO-KU KYOTO JAPAN) TENJINKITA-MACHI 1-1 TERANOUCHI-AGARU 4-CHOME HORIKAWA-DORI KAMIGYO-KU KYOTO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukutomi, Yoshiteru Kyoto , JP 35 726
Kawamatsu, Yasuo Kyoto , JP 20 260
Mitsuhashi, Tsuyoshi Kyoto , JP 52 716
Morinishi, Kenya Kyoto , JP 28 507
Nagashima, Hiromichi Kyoto , JP 17 226
Ogura, Hiroyuki Kyoto , JP 75 1730

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