LINEAR DEPOSITION SOURCES FOR DEPOSITION PROCESSES
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United States of America Patent
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N/A
Issued Date -
Jun 4, 2009
app pub date -
Jul 30, 2007
filing date -
Aug 4, 2006
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Linear deposition sources are disclosed. In one embodiment, the linear deposition source includes a container accommodating evaporation material and a heater configured to generate heat energy such that vaporized material is discharged uniformly onto a substrate on which a deposition layer is formed. The heater is provided on the container, wherein a portion of the heater positioned at a center portion of the container in the longitudinal direction generates more heat energy than the other portion of the heater. The heater includes a coil configured in a sinusoidal pattern, wherein the curvature pitch or height of the portion of the coil positioned at the center portion of the container in the longitudinal direction is set to be different from that of the other portion of the coil. Further, the resistance of the portion of the coil positioned at the center portion of the container in the longitudinal direction may be set to be greater than that of the other portion of the coil.
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