METHOD FOR SILVER PLATING

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United States of America Patent

APP PUB NO 20090159453A1
SERIAL NO

12172104

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The aim of the present invention is to provide a method for silver plating that does not comprise the step of forming the nickel-underlayer and that can form a silver-plated layer having sufficient adherence directly on the difficult-to-plate substrates with the use of a halide-free plating bath under a good working environment. The present invention provides a silver plating method onto a substrate on which an oxide layer inhibiting adherence of a plated layer is prone to form, comprising at least the following steps of; (A) degreasing the substrate, (B) removing the oxide layer with a strongly acidic solution from the substrate, and (C) silver plating onto the substrate, without a step of nickel or nickel alloy strike plating in advance, utilizing a phosphines-containing acidic silver plating bath which essentially does not contain halide ion or cyanide ion.

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Patent Owner(s)

Patent OwnerAddress
DAIWA FINE CHEMICALS CO LTDAKASHI-SHI HYOGO-KEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kadokawa, Toshifumi Akashi-shi , JP 7 8
Kitamura, Shingo Akashi-shi , JP 36 145
Omori, Seiji Akashi-shi , JP 7 20
Yoshimoto, Masakazu Akashi-shi , JP 42 688

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