SUBSTRATE TREATING APPARATUS
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United States of America Patent
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app pub date -
Mar 3, 2009
filing date -
Aug 30, 2002
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A substrate treating apparatus comprising a treatment chamber for housing a substrate, a stage on which the substrate is placed within the treatment chamber, a heating member arranged within the stage and used for heating the substrate, a sealing member arranged between the stage and the treatment chamber, and a cooling mechanism having a cooling medium, whose latent heat of vaporization is utilized for cooling the sealing member.
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