POLISHING PAD AND POLISHING METHOD
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United States of America Patent
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Issued Date -
Jul 2, 2009
app pub date -
Aug 15, 2008
filing date -
Dec 28, 2007
priority date (Note) -
Abandoned
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Abstract
A polishing pad and a polishing method are described. The polishing pad is made from a composition compresing a polymeric matrix, an additive, and a rheology altering agent. The rheology altering agent enables a uniform distribution of the additive in the polymeric matrix.
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