SHOWERHEAD AND CHEMICAL VAPOR DEPOSITION APPARATUS HAVING THE SAME
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United States of America Patent
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N/A
Issued Date -
Jul 16, 2009
app pub date -
Aug 22, 2008
filing date -
Jan 15, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
There is provided a showerhead including: a first head having at least one gas conduit provided therein to allow a first reaction gas to be supplied into a reaction chamber; a second head having a hole of a predetermined size formed to have the gas conduit extending therethrough; and a gas flow path formed between the gas conduit extending through the hole and the hole to allow a second reaction gas to be supplied into the reaction chamber.
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