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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
TOKYO OHKA KOGYO CO LTD	150 NAKAMARUKO NAKAHARA-KU KAWASAKI-SHI KANAGAWA 211-0012

International Classification(s)

• C08F:MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONL....
• G03C:PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES....
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Dazai, Takahiro	Kawasaki-shi , JP	73	876
Furuya, Sanae	Kawasaki-shi , JP	12	286
Hirano, Tomoyuki	Kawasaki-shi , JP	119	1838
Mori, Takayoshi	Kawasaki-shi , JP	50	396
Shiono, Daiju	Kawasaki-shi , JP	71	860

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

Full Text

US Patent Application No: 2009/0186,300

RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING COPOLYMER

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