Method for fabricating nanogap and nanogap sensor

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United States of America Patent

PATENT NO 8557567
APP PUB NO 20090215156A1
SERIAL NO

11887978

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Abstract

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The present invention relates to a method of fabricating a nanogap and a nanogap sensor, and to a nanogap and a nanogap sensor fabricated using the method. The present invention relates to a method of fabricating a nanogap and a nanogap sensor, which can be realized by an anisotropic etching using a semiconductor manufacturing process. According to the method of present invention, the nanogap and nanogap sensor can be simply and cheaply produced in large quantities.

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Patent Owner(s)

Patent OwnerAddress
MICOBIOMED CO LTDKRIBB BVC NO 201 52 EOEUN-DONG YUSEONG-GU DAEJEON 305-806

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chung, Bong hyun Daejeon, KR 44 185
Kim, Sang kyu Tsean-gun, KR 73 89
Park, Hye jung Daejeon, KR 9 48

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