Mask and design method thereof

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United States of America Patent

PATENT NO 7919216
SERIAL NO

12270566

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Abstract

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A mask and the design method thereof are provided. The mask includes a light-shielding area shielding off a light, wherein the light-shielding area includes a photonic crystal having a lattice constant, and a ratio of the lattice constant to a wavelength of the light is a specific value within a band gap of the photonic crystal.

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Patent Owner(s)

Patent OwnerAddress
NANYA TECHNOLOGY CORPHWA-YA TECHNOLOGY PARK 669 FUHSING 3 RD KUEISHAN TAO-YUAN HSIEN

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Teng-Yen Taipei, TW 21 21
Lin, Chia-Wei Taipei, TW 53 186

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